Advances in Imaging and Electron Physics

Other | October 1, 1997

byMulvey, Tom, Tom Mulvey

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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, im...

Peter Hawkes graduated from the University of Cambridge and subsequently obtained his PhD in the Electron Microscopy Section of the Cavendish Laboratory. He remained there for several years, working on electron optics and digital image processing before taking up a research position in the CNRS Laboratory of Electron Optics (now CEMES-...

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Advances in Imaging and Electron Physics
Advances in Imaging and Electron Physics

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Format:OtherDimensions:330 pages, 1 × 1 × 1 inPublished:October 1, 1997Publisher:Academic PressLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080577687

ISBN - 13:9780080577685

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Table of Contents

Contributors. Preface.R. Albanese and G. Rubinacci,Finite Element Methods for the Solution of 3D Eddy Current Problems:Introduction. Field Equations and Material Properties. Fields, Potentials, and Gauges. Edge Elements for 3D Field Problems. Integral Formulations for Linear and Nonlinear Eddy Currents. Differential Formulations and Constitutive Error Approach. Discussion and Conclusions. Acknowledgments. References.W. Chen and H. Ahmed,Nanofabricationfor Electronics:Introduction. Nanofabrication Methods. Pattern Transfer. Resolution Limit of Organic Resists. Applications of Nanostructures. References.A.D. Feinerman and D.A. Crewe,Miniature Electron Optics:Introduction. Scaling Lawsfor Electrostatic Lenses. Review. Fabrication of Miniature Magnetostatic Lenses. Electron Source. Detector. Electron Optical Calculations. Performance of a Stacked Einzel Lens. Summary and Future Prospects. References.S.A. Nepijko and N.N. Sedov,Aspects of Mirror Electron Microscopy:Introduction. Resolution of Mirror Electron Microscope. Distortion of Details of Object Image Under Observation in Mirror Electron Microscope. Limiting Sensitivity of Mirror Electron Microscope under Observation of Steps on Object. Image of Islands on Object Surfaces in Mirror Electron Microscope. Calculation of Image Contrast in Mirror Electron Microscope in the Focused Operation Mode. Conclusions. Acknowledgment. References. Subject Index.