Design for Manufacturability and Yield for Nano-Scale CMOS by Charles ChiangDesign for Manufacturability and Yield for Nano-Scale CMOS by Charles Chiang

Design for Manufacturability and Yield for Nano-Scale CMOS

byCharles Chiang, Jamil Kawa

Paperback | November 22, 2010

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This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA
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Title:Design for Manufacturability and Yield for Nano-Scale CMOSFormat:PaperbackDimensions:281 pagesPublished:November 22, 2010Publisher:Springer NetherlandsLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:9048173035

ISBN - 13:9789048173037

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Table of Contents

1. Introduction of DFM/DFY. a. What is DFM/DFY ? historical perspective. b. Why is it becoming ever so critical? c. DFM categories & classifications. d. How do various DFM solutions tie up with specific design flows. e. DFM & DFY are intertwined.2. Random Defects. a. CAA. b. Improving CAA. c. Cell library yield grading based on CAA. 3. Systematic yield. a. Lithography. 4. Systematic yield. b. CMP5. Parametric yield. a. Intro. b. Timing aspects. c. Power considerations.6. Design for yield. a. analysis. b. prediction. c. enhancement.7. Summary and Conclusions