Developments In Surface Contamination And Cleaning, Vol. 1: Fundamentals And Applied Aspects

Hardcover | November 16, 2015

byRajiv KohliEditorKashmiri L. Mittal

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Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field

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Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering t...

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellat...

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Format:HardcoverDimensions:894 pages, 9.41 × 7.24 × 0.98 inPublished:November 16, 2015Publisher:William Andrew PublishingLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0323299601

ISBN - 13:9780323299602

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Table of Contents

Part 1 Fundamentals
1 The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2 Transport and Deposition of Aerosol Particles
3 Relevance of Particle Transport in Surface Deposition and Cleaning
4 Aspects of Particle Adhesion and Removal
5 Tribological Implications of Particles
6 ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7 Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries
Part 2 Characterization
8 Surface Analysis Methods for Contaminant Identification
9 Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10 Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3 Techniques for Removal of Surface Contamination
11 Cleaning with Solvents Durkee Reprint
12 Removal of Particles by Chemical Cleaning
13 The Use of Surfactants to Enhance Particle Removal from Surfaces
14 Microabrasive Precision Cleaning and Processing Technology
15 Cleaning Using High-Speed Impinging Jet
16 Carbon Dioxide Snow Cleaning Sherman Update
17 Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18 Coatings for Preventing or Deactivation of Biological Contaminants
19 A Detailed Study of Semiconductor Wafer Drying