Dry Etching for VLSI by A.J. van RoosmalenDry Etching for VLSI by A.J. van Roosmalen

Dry Etching for VLSI

byA.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader

Hardcover | March 31, 1991

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Based on the manual for an annual course given by the Phillips Research Laboratories in The Netherlands, reviews all aspects of etching with gas plasmas for VLSI in silicon semiconductor processing. At a level suitable for seniors and graduate students, discusses the fundamentals, systems, processes, tools, and applications. Includes 50 pages of abstracts of selected works cited in the extensive bibliography. Acidic paper. Annotation(c) 2003 Book News, Inc., Portland, OR (booknews.com)
Title:Dry Etching for VLSIFormat:HardcoverDimensions:254 pages, 10 × 7.01 × 0.03 inPublished:March 31, 1991Publisher:Springer USLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0306438356

ISBN - 13:9780306438356

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