Dry Etching for VLSI

Hardcover | March 31, 1991

byA.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader

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Based on the manual for an annual course given by the Phillips Research Laboratories in The Netherlands, reviews all aspects of etching with gas plasmas for VLSI in silicon semiconductor processing. At a level suitable for seniors and graduate students, discusses the fundamentals, systems, processes, tools, and applications. Includes 50 pages of abstracts of selected works cited in the extensive bibliography. Acidic paper. Annotation(c) 2003 Book News, Inc., Portland, OR (booknews.com)

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From the Publisher

Based on the manual for an annual course given by the Phillips Research Laboratories in The Netherlands, reviews all aspects of etching with gas plasmas for VLSI in silicon semiconductor processing. At a level suitable for seniors and graduate students, discusses the fundamentals, systems, processes, tools, and applications. Inclu...

Format:HardcoverDimensions:254 pages, 10 × 7.01 × 0.27 inPublished:March 31, 1991Publisher:Springer USLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0306438356

ISBN - 13:9780306438356

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