Effect Of Disorder And Defects In Ion-implanted Semiconductors: Optical And Photothermal…

Other | June 1, 1997

byWillardson, R. K., R. K. Willardson

not yet rated|write a review
Defects in ion-implanted semiconductors are important and will likely gain increased importance as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer after high temperature annealing. The editors of this volume and Volume 45 focus on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented.

Key Features
* Provides basic knowledge of ion implantation-induced defects
* Focuses on physical mechanisms of defect annealing
* Utilizes electrical, physical, and optical characterization tools for processed semiconductors
* Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination

Pricing and Purchase Info

$252.69 online
$328.08 list price (save 22%)
In stock online
Ships free on orders over $25

From the Publisher

Defects in ion-implanted semiconductors are important and will likely gain increased importance as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this ...

Format:OtherDimensions:316 pages, 1 × 1 × 1 inPublished:June 1, 1997Publisher:Academic PressLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080864430

ISBN - 13:9780080864433

Customer Reviews of Effect Of Disorder And Defects In Ion-implanted Semiconductors: Optical And Photothermal Characterization

Reviews

Extra Content

Table of Contents

Optical Characterization:
M Fried, T. Lohner, and J. Gyulai, Ellipsometric Analysis.
A. Seas and C. Christofides, Transmission and Reflection Spectoscopy on Ion Implanted Semiconductors.
A. Othonos, Photoluminescence and Raman Scattering of Ion Implanted Semiconductors: Influence of Annealing.
Thermal Wave Analyses:
C. Cristofides, Photomodulated Thermoreflectance Investigation of Implanted Wafers: Annealing Kinetics of Defects.
U. Zammit, Photothermal Delection Spectroscopy Characterization of Ion-Implanted and Annealed Si Films.
A. Mandelis, A. Budiman, and M. Vargas, Photothermal Deep Level Transient Spectroscopy of Impurities and Defects in Semiconductors.
Quantum Well Structures and Compound Systems:
R. Kalish and S. Charbonneau, Ion Implantation into Quantum Well Structures.
A.M. Myasnikov and N.N. Gerasimenko, Ion Implantation and Thermal Annealing of III-V Compound Semiconducting Systems: Some Problems of III-V Narrow Gap Semiconductors.
Subject Index.