Ellipsometry for Industrial Applications by Karl RiedlingEllipsometry for Industrial Applications by Karl Riedling

Ellipsometry for Industrial Applications

byKarl Riedling

Paperback | December 14, 1987

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During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested.
Title:Ellipsometry for Industrial ApplicationsFormat:PaperbackPublished:December 14, 1987Publisher:Springer ViennaLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:321182040X

ISBN - 13:9783211820407

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Table of Contents

1. Basics of Ellipsometry.- 1.1 Physics.- 1.2 Instrumentation.- 1.2.1 Null Ellipsometry.- 1.2.2 Photometric Ellipsometry.- 1.3 Developments in Ellipsometry.- 1.4 Static and Dynamic Ellipsometry.- 2. Ellipsometry in Microelectronic Technology.- 2.1 Semiconductor Substrates and Films.- 2.2 Insulating Films.- 2.3 Etching Processes.- 3. Error Effects in Ellipsometric Investigations.- 3.1 Random Measurement Errors.- 3.2 Instrumentation Error Effects.- 3.2.1 Null Ellipsometers.- 3.2.1.1 Error Sources.- 3.2.1.2 Numerical Alignment.- 3.2.2 Rotating Analyzer Ellipsometers.- 3.2.2.1 Intrinsic Accuracy.- 3.2.2.2 Angular Encoder Orbiting.- 3.2.2.3 Periodic and Random Noise.- 3.2.2.4 The Influence of the Error Effects Discussed on the Ellipsometric Angles ? and ?.- 3.2.2.5 Design Rules for Rotating Analyzer Ellipsometers.- 3.3 Effects of the Sample Structure.- 3.3.1 Substrate Refractive Index.- 3.3.2 Interface Layer Between Substrate and Film.- Appendix A: Design Considerations for a High-Speed Rotating.- Analyzer Ellipsometer.- Al The Optical Assembly.- A2 Electronic Interface Circuitry.- A3 The Microcomputer System.- A3.1 Hardware.- A3.2 Software.- References.