Laser Crystallization of Silicon - Fundamentals to Devices

Other | December 1, 2003

byNickel, Norbert H., Norbert H. Nickel

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This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.
Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

Valuable applications for industry, particularly in the fabrication of thin-film electronics
Each chapter has been peer reviewed
An important and timely contribution to the semiconductor literature

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From the Publisher

This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.Reflecting the truly i...

Format:OtherDimensions:204 pages, 1 × 1 × 1 inPublished:December 1, 2003Publisher:Academic PressLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080540945

ISBN - 13:9780080540948

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Table of Contents

Preface; introduction to laser crystallization of silicon; heat transfer and phase transformations in laser melting and recrystallization of amorphous thin si films; modelling laser-induced phase change processes: theory and computation; laser interference crystallization of amorphous films; structural and electronic properties of laser crystallized poly-si.