Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications

Hardcover | May 28, 2012

EditorIvo Utke, Stanislav Moshkalev, Phillip Russell

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Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in afast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing,are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping.Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beamswith gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Specialattention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

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Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FE...

Ivo Utke is Vice Head of the Laboratory for Mechanics of Materials and Nanostructures at EMPA, The Swiss Federal Laboratories for Materials Testing and Research. Stanislav Moshkalev is Head of the Nanotechnology Group at the Center for Semiconductor Components, UNICAMP, Campinas, Brazil. Phillip E. Russell is Distinguished Professor...

other books by Ivo Utke

Format:HardcoverDimensions:800 pages, 0.12 × 0.12 × 0.12 inPublished:May 28, 2012Publisher:Oxford University PressLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0199734216

ISBN - 13:9780199734214

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Table of Contents

Introduction1-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials1-2. Historical evolution of FIB technology: from circuit editing to nanoprototypingPart IFundamentals and Models1. The theory of bright field electron and field ion emission sources2. How to select compounds for focused charged particle beam assisted etching and deposition3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment4. Fundamentals of interactions of electrons with molecules5. Simulation of focused ion beam milling6. FEB and FIB continuum models for one molecule species7. Continuum modeling of electron beam induced processes8. Monte Carlo method in EBID process simulationsPart IIApplications9. Focused electron beam induced processing (FEBIP) for industrial applications10. Focused Ion Beam and DualBeamTM technology applied to nanoprototyping11. Review of FIB-tomography12. In-situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and ion- assisted metal deposition for the fabrication of nanodevices based on individual nanowires15. Focused ion beam fabrication of carbon nanotube and ZnO nanodevices16. Focused Ion and Electron Beam induced deposition of magnetic nanostructures17. Metal films deposited by FIB and FEB for nanofabrication and nanocontacting purposes18. FIB Etching for Photonic Device Applications19. Gas assisted FIB etching of InP for rapid-prototyping of photonic crystals20. Applications of FIB for rapid prototyping of photonic devices, fabrication of nano sieve, nanowire and nano antennas21. Focused particle beam induced deposition of silicon dioxide22. Growth and characterization of FEB-deposited suspended nanostructures23. Electrical transport properties of metallic nanowires and nanoconstrictions created with FIB24. Structure-property relationship in electronic transport on FEBID structures25. Characterization of nanostructured carbon materials using FIB26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication using Electron Beam Lithography Processes