Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies by M. GentiliNanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies by M. Gentili

Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies

EditorM. Gentili, Carlo Giovannella, Stefano Selci

Paperback | December 5, 2010

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Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Title:Nanolithography: A Borderland between STM, EB, IB, and X-Ray LithographiesFormat:PaperbackDimensions:227 pages, 9.25 × 6.1 × 0.03 inPublished:December 5, 2010Publisher:Springer NetherlandsLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:9048143888

ISBN - 13:9789048143887

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Table of Contents

Preface. Electron Beam Lithography. Nanolithography, the Integrated System; F.J. Hohn. Electron Beam Resists and Pattern Transfer Methods; M. Hatzakis. Nanolithography developed through Electron-Beam-Induced Surface Reaction; S. Matsui, Y. Ochiai, M. Baba, H. Watanabe. Direct Writing of Nanoscale Patterns in SiO2; X. Pan, A.N. Broers. Sub-10 nm Electron Beam Lithography: -AIF-Doped Lithium Fluoride as a Resist; W. Langheinrich, H. Beneking. Surface Imaging for EB-Nanolithography; M. Böttcher, L. Bauch, A. Wolff, W. Höppner. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier; A. Schmidt, F. Faller, A. Forchel. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching; P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski. Fabrication, Investigation and Manipulation of Artificial Nanostructures; A. Menschig, F.E. Prins, G. Lehr, R. Bergmann, J. Hommel, U.A. Griesinger, V. Härle, F. Scholz, H. Schweizer. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition; H.W.P. Koops, M. Rudolph, J. Kretz, M. Weber. Nanolithography Requirements -- an Equipment Manufacturer's View; B.A. Wallman, G. Crawley. X-Ray Lithography. X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing; H.I. Smith, M.L. Schattenburg. X-Ray Phase Shifting Masks; F. Cerrina, J. Xiao, Z.Y. Guo. Fabrication of X-Ray Mask for Nanolithography by EBL; M. Gentili. Ion Beam Lithography. Intense Focused Ion Beams for Nanostructurisation; S. Kalbitzer, Ch. Wilbertz, Th. Miller. Latest Results Obtained with the Alpha Ion Projection Machine; W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl, F. Thalinger, H. Löschner, G. Stengl, P. Hudek. STM Lithography. Direct Writing with a Combined STM/SEM System; A.L. de Lozanne, W.F. Smith, E.E. Ehrichs. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope; C.R.K. Marrian, F.K. Perkins, S.L. Brandow, T.S. Koloski, E.A. Dobisz, J.M. Calvert. STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide; J.A. Dagata. Sub-20 nm Lithographic Patterning with the STM; L. Stockman, C. Van Haesendonck, G. Neuttiens, Y. Bruynseraede. Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope; I. Heyvaert, E. Osquiguil, C. Van Haesendonck, Y. Bruynseraede. Author Index. Subject Index.