Plasma Etching: An Introduction

Other | September 8, 1989

byDennis M. Manos, Dennis M. Manos, Daniel L. Flamm

not yet rated|write a review
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

Pricing and Purchase Info

$62.39 online
$81.00 list price (save 22%)
In stock online
Ships free on orders over $25

From the Publisher

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of p...

Format:OtherDimensions:476 pages, 1 × 1 × 1 inPublished:September 8, 1989Publisher:Elsevier ScienceLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080924468

ISBN - 13:9780080924465

Customer Reviews of Plasma Etching: An Introduction

Reviews

Extra Content

Table of Contents

D.L. Flamm and G.K. Herb,Plasma Etching Technology. An Overview.D.L. Flamm,Introduction to Plasma Chemistry.S.A. Cohen,An Introduction to Plasma Physics for Materials Processing.D.M. Manos and H.F. Dylla,Diagnostics of Plasmas for Materials Processing.A.R. Reinberg,Plasma Etch Equipment and Technology.J.M.E. Harper,Ion Beam Etching.G.K. Herb,Safety, Health, and Engineering Considerations for Plasma Processing.