Plasma Etching: An Introduction by Dennis M. ManosPlasma Etching: An Introduction by Dennis M. Manos

Plasma Etching: An Introduction

byDennis M. Manos, Dennis M. Manos, Daniel L. Flamm

Other | September 8, 1989

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Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
Title:Plasma Etching: An IntroductionFormat:OtherDimensions:476 pages, 1 × 1 × 1 inPublished:September 8, 1989Publisher:Elsevier ScienceLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080924468

ISBN - 13:9780080924465

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Table of Contents

D.L. Flamm and G.K. Herb,Plasma Etching Technology. An Overview.D.L. Flamm,Introduction to Plasma Chemistry.S.A. Cohen,An Introduction to Plasma Physics for Materials Processing.D.M. Manos and H.F. Dylla,Diagnostics of Plasmas for Materials Processing.A.R. Reinberg,Plasma Etch Equipment and Technology.J.M.E. Harper,Ion Beam Etching.G.K. Herb,Safety, Health, and Engineering Considerations for Plasma Processing.