Plasma Etching: Fundamentals and Applications

Hardcover | May 1, 1998

byM. Sugawara

not yet rated|write a review
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Pricing and Purchase Info

$307.49 online
$435.00 list price (save 29%)
Ships within 1-3 weeks
Ships free on orders over $25

From the Publisher

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430

other books by M. Sugawara

Introduction to VLSI Process Engineering
Introduction to VLSI Process Engineering

Kobo ebook|Dec 6 2012

$157.69 online$204.78list price(save 22%)
Blood Flow in the Heart and Large Vessels
Blood Flow in the Heart and Large Vessels

Kobo ebook|Mar 9 2013

$86.79 online$112.62list price(save 22%)
see all books by M. Sugawara
Format:HardcoverDimensions:356 pages, 9.21 × 6.14 × 0.91 inPublished:May 1, 1998Publisher:Oxford University Press

The following ISBNs are associated with this title:

ISBN - 10:019856287X

ISBN - 13:9780198562870

Look for similar items by category:

Customer Reviews of Plasma Etching: Fundamentals and Applications

Reviews

Extra Content

Table of Contents

1. Introduction2. RF discharges3. Physical basis of plasma etching process4. Diagnostics of plasma particles and potentials5. Technology of reactive ion etching6. Magnetic field coupled etchers7. ECR plasma etchers8. Future propectsIndex