Plasma Etching: Fundamentals and Applications by M. Sugawara

Plasma Etching: Fundamentals and Applications

byM. Sugawara

Hardcover | May 1, 1998

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

About The Author

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430

Details & Specs

Title:Plasma Etching: Fundamentals and ApplicationsFormat:HardcoverDimensions:356 pages, 9.21 × 6.14 × 0.91 inPublished:May 1, 1998Publisher:Oxford University Press

The following ISBNs are associated with this title:

ISBN - 10:019856287X

ISBN - 13:9780198562870

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Extra Content

Table of Contents

1. Introduction2. RF discharges3. Physical basis of plasma etching process4. Diagnostics of plasma particles and potentials5. Technology of reactive ion etching6. Magnetic field coupled etchers7. ECR plasma etchers8. Future propectsIndex