Principles of Vapor Deposition of Thin Films

Other | December 1, 2005

bySree Harsha, Professor K.S. K.S, Professor K.s. K.s Sree Harsha

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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.

Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

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From the Publisher

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in t...

Format:OtherDimensions:1176 pages, 1 × 1 × 1 inPublished:December 1, 2005Publisher:Elsevier ScienceLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:0080480314

ISBN - 13:9780080480312

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