Simulation of Semiconductor Processes and Devices 2001: SISPAD 01

byDimitris TsoukalasEditorChristos Tsamis

Paperback | October 14, 2012

Simulation of Semiconductor Processes and Devices 2001: SISPAD 01 by Dimitris Tsoukalas
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This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5-7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.
Macroscopic Quantum Carrier Transport Modeling.- Atomistic Front-End Process Modelling: A Powerful Tool for Deep-Submicron Device Fabrication.- Monte Carlo Impurity Diffusion Simulation Considering Charged Species.- A Novel Model for Boron Diffusion in SiGe Strained Layers Based on a Kinetics Driven Ge-B Pairing Mechanism.- The Role of...
Title:Simulation of Semiconductor Processes and Devices 2001: SISPAD 01Format:PaperbackDimensions:455 pages, 23.5 X 15.5 X 0 inPublished:October 14, 2012Publisher:Springer-Verlag/Sci-Tech/TradeLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:3709172780

ISBN - 13:9783709172780

Appropriate for ages: All ages

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