Theory and Application of Laser Chemical Vapor Deposition by J. Mazumder

Theory and Application of Laser Chemical Vapor Deposition

byJ. Mazumder, Aravinda Kar

Hardcover | October 31, 1995

not yet rated|write a review

Pricing and Purchase Info


Earn 1620 plum® points

In stock online

Ships free on orders over $25

Not available in stores


In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

Details & Specs

Title:Theory and Application of Laser Chemical Vapor DepositionFormat:HardcoverDimensions:408 pages, 9.02 × 5.98 × 0 inPublished:October 31, 1995Publisher:Springer US

The following ISBNs are associated with this title:

ISBN - 10:0306449366

ISBN - 13:9780306449369

Look for similar items by category:

Customer Reviews of Theory and Application of Laser Chemical Vapor Deposition


Extra Content

Table of Contents

Introduction. Pyrolytic LCVD. Photolytic LCVD. Pyrolytic LCVD Modeling. Photolytic LCVD Modeling. Appendix A: Definitions of Energy Density, Irradiance, and Intensity. Appendix B: Thermal Stress Analysis. Appendix C: Volumetric Absorption Rate. Appendix D: Physical Constants and Conversion Factor. Index.