Thin Film Diamond by A.H. LettingtonThin Film Diamond by A.H. Lettington

Thin Film Diamond

byA.H. LettingtonEditorJ.w. Steeds

Paperback | November 5, 2012

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ThIS volume contaInS a selectIOn of InvIted revIew papers presented at a Royal SocIety DIscussIOn meetIng on ThIn FIlm DIamond held In London on 15 and 16 July 1992 The topIC of low pressure synthesIs has attracted world wIde Interest and become IncreasIngly active In recent years due to the pOSSIble use of dIamond films In commerCIal apphcatlOns Until recently commercIal dIamond synthesIs was almost entIrely by the hIgh pressure hIgh temperature technIque In whIch dIamond IS precIpItated as an eqUlhbnum phase from a carbon-contaInIng hqUld metal catalyst In thIS way crystals may be formed up to 10mm or so In sIze The metastable low pressure techmques cannot compete In cost but can be used to fabrIcate large area wafers or predetermIned shapes not pOSSIble by other means Most of the low pressure techmques stem from the work of Eversole whICh was first reported In 1962 He exposed a hot dIamond substrate alternately to a hydrocarbon gas, whIch deposIted a mIxture of dIamond and graphIte, and then to hydrogen, whICh preferen­ tIally etched away the graphite In later developments th<_se20_two20_stages20_have20_been20_combined20_to20_form20_a20_continuous20_process20_and20_differ20_only20_in20_the20_way20_the20_etchant20_is20_generated20_in20_this20_volume20_an20_historical20_overview20_of20_these20_low20_pressure20_growth20_techmques20_and20_a20_description20_of20_diamond20_and20_crystal20_morphology20_is20_given20_by20_john20_angus20_and20_his20_co-authors20_in20_their20_paper20_on20_the20_chemical20_vapour20_deposition20_of20_diamond20_james20_butler20_and20_richard20_woodin two="" stages="" have="" been="" combined="" to="" form="" a="" continuous="" process="" and="" differ="" only="" in="" the="" way="" etchant="" is="" generated="" this="" volume="" an="" historical="" overview="" of="" these="" low="" pressure="" growth="" techmques="" description="" diamond="" crystal="" morphology="" given="" by="" john="" angus="" his="" co-authors="" their="" paper="" on="" chemical="" vapour="" deposition="" james="" butler="" richard="">
Title:Thin Film DiamondFormat:PaperbackDimensions:157 pagesPublished:November 5, 2012Publisher:Springer-Verlag/Sci-Tech/TradeLanguage:English

The following ISBNs are associated with this title:

ISBN - 10:9401043124

ISBN - 13:9789401043120


Table of Contents

Chemical vapour deposition of diamond - J C Angus; Thin film diamond growth mechanisms - J E Butler; Microwave plasma chemical vapour deposition and related techniques for low pressure diamond synthesis - P K Bachmann; Local epitaxial growth of diamond on nickel from the vapour phase - Y Sato; The optical and electronic properties of semiconducting diamond - A T Collins; The thermal conductivity of CVD diamond films - T R Anthony; Electron irradiation and heat treatment of polycrystalline CVD diamond - C D Clark; Strength, fracture and erosion properties of CVD diamond - J E Field. Deposition of diamond-like carbon - J Robertson; Applications of diamond-like carbon thin films - A H Lettington; Diamond as a wear-resistant coating - B Lux; Thermal and optical applications of thin film diamond - M Seal.

Editorial Reviews

Researchers in materials, physics and mechanical engineering will find this book a timely review of a rapidly advancing field and it will provide practicing engineers in the elctronics and manufacturing industries with a valuable overview of thin film diamond for years to come - Diamond Films and Technology